ALIGNMENT METHOD FOR PATTERNING

• Main Authors: URAYAMA; KAZUHIKO, TARUI; ATSUSHI, KAMATA; YUTAKA
• Format: Patent
• Language: English
• Published: 22.10.1991
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

There is provided an alignment method for the patterning used in the lithographic process for semiconductor devices. This alignment method includes the steps of irradiating an alignment light onto a positioning mark portion (30-32) on a resist-coated semiconductor substrate, and performing positioni...