Method of manufacturing color filter including exposing planarizing layer through openings in a medium layer

A color filter and manufacturing method thereof are provided which can improve the optical transmittance and diminish the dispersion phenomena due to the diffraction and reflectance of incident light. The color filter has at least two mutually different filtering characteristics respectively corresp...

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Bibliographic Details
Main Authors PARK; HAN-SU, LEE; HYEONG-SEOK, JEONG; DEOK-KI
Format Patent
LanguageEnglish
Published 01.10.1991
Subjects
ADVERTISING
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CRYPTOGRAPHY
DISPLAY
DISPLAYING
EDUCATION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
LABELS OR NAME-PLATES
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEALS
SEMICONDUCTOR DEVICES
SIGNS
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Summary:A color filter and manufacturing method thereof are provided which can improve the optical transmittance and diminish the dispersion phenomena due to the diffraction and reflectance of incident light. The color filter has at least two mutually different filtering characteristics respectively corresponding to the plural pixels placed in a matrix on the background substrate. The color filter includes a planarizing layer, a color filter pattern, a coloring layer and a protective layer. The method for manufacturing the color filter involves forming a planarizing layer, a color filter pattern, and a protective layer.
Bibliography:Application Number: US19900491101