Purification of sulfuryl fluroide by selective adsorption

Many impurities of sulfuryl fluroide are removed by selective adsorption on activated alumina and activated carbon. Thionyl fluoride, hydrogen fluoride, hydrogen chloride, and water are removed by treating contaminated sulfuryl fluoride with activated alumina. Sulfur dioxide and 1,2-dichloroethane a...

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Bibliographic Details
Main Authors FRIESE; DAVID D, FUJIOKA; GEORGE S, TOBEY; BRIAN G
Format Patent
LanguageEnglish
Published 21.08.1990
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:Many impurities of sulfuryl fluroide are removed by selective adsorption on activated alumina and activated carbon. Thionyl fluoride, hydrogen fluoride, hydrogen chloride, and water are removed by treating contaminated sulfuryl fluoride with activated alumina. Sulfur dioxide and 1,2-dichloroethane are removed by treating contaminated sulfuryl fluoride with activated carbon. When sulfuryl fluoride is treated with the two adsorbents in sequence, sulfuryl fluoride of exceptionally high purity is obtained.
Bibliography:Application Number: US19890309459