Free radically initiated process
Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
26.06.1990
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| Subjects | |
| Online Access | Get full text |
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| Abstract | Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free radically initiated changes initiated by exposing the substituted diazene to light and heat. |
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| AbstractList | Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free radically initiated changes initiated by exposing the substituted diazene to light and heat. |
| Author | WOLF; RICHARD A WHITE; JERRY E |
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| Discipline | Medicine Chemistry Sciences Physics |
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| Notes | Application Number: US19890299201 |
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| PublicationDate | 19900626 |
| PublicationDateYYYYMMDD | 1990-06-26 |
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| PublicationDecade | 1990 |
| PublicationYear | 1990 |
| RelatedCompanies | THE DOW CHEMICAL COMPANY |
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| Snippet | Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS |
| Title | Free radically initiated process |
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