Free radically initiated process

Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free...

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Bibliographic Details
Main Authors WHITE; JERRY E, WOLF; RICHARD A
Format Patent
LanguageEnglish
Published 26.06.1990
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
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Summary:Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free radically initiated changes initiated by exposing the substituted diazene to light and heat.
Bibliography:Application Number: US19890299201