Electron-beam positive polyimide

An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.

Saved in:
Bibliographic Details
Main Authors MOORE; JAMES A, KAUFMAN; FRANK B, DASHEFF; ANDREW N
Format Patent
LanguageEnglish
Published 12.12.1989
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CABLES
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
CONDUCTORS
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
INSULATORS
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

Cover

More Information
Summary:An insoluble electron beam positive polyimide having the formula can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.
Bibliography:Application Number: US19880240392