Method for preparing substrates for optical sensors
Bodies of borosilicate glass with a B2O3 content of less than 13 percent by weight are provided with a microporous layer of a thickness of 5 to 20 mu m, and are thus turned into carriers for optical sensors. This process is characterized by the following steps. Thermal decomposition for 5 to 10 days...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
11.10.1988
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Edition | 4 |
Subjects | |
Online Access | Get full text |
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Summary: | Bodies of borosilicate glass with a B2O3 content of less than 13 percent by weight are provided with a microporous layer of a thickness of 5 to 20 mu m, and are thus turned into carriers for optical sensors. This process is characterized by the following steps. Thermal decomposition for 5 to 10 days at 500 DEG to 560 DEG C.; removal of the topmost layer of glass to a depth of at least 10 mu m in the part of the surface to be rendered porous; leaching of the separated borate phase with diluted mineral acids for a minimum of 2 days at 70 DEG to 98 DEG C.; and after-treatment of the microporous layer, including (a) chemical treatment with concentrated sulphuric acid and concentrated nitric acid for 2 hours at 20 DEG C., and (b) heat-treatment for 10 minutes to 2 hours at 450 DEG to 700 DEG C. |
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Bibliography: | Application Number: US19870053617 |