In-line disk sputtering system

• Main Authors: MILLER; KEN, FLINT; ALAN, SHAH; SUSHIL
• Format: Patent
• Language: English
• Published: 07.06.1988
• Edition: 4
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS

A step-dwell transport apparatus and method for use in an in-line controlled environment processing system is disclosed. The transport apparatus employs a plurality of shuttles arranged in series along two parallel rails. Each shuttle carries one or more planar objects through a process chamber, which contains several in-line processing stations. One of the rails guides a queue of abutting shuttles through the process chamber, while the other rail serves as a return path for another queue of abutting shuttles. The shuttles move along each rail, with locomotion along the rail being provided by a pneumatic cylinder and linkage that periodically pushes forward the trailing shuttle in the queue. Transfer mechanisms are provided at each end of the apparatus to transfer individual shuttles from the end of one rail to the beginning of the other rail. Shuttles are supplied to and withdrawn from the process chamber one at a time through in-line air locks.