Plasma developable photoresist compositions containing N-substituted 3-vinylcarbazoles

Disclosed is a photoresist using a 3-vinylcarbazole as the photopolymerizable monomer.

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Bibliographic Details
Main Author TISE; FRANK P
Format Patent
LanguageEnglish
Published 21.04.1987
Edition4
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a photoresist using a 3-vinylcarbazole as the photopolymerizable monomer.
Bibliography:Application Number: US19850789601