Semiconductor radiation detector

A radiation detector includes a detection element having a single crystal silicon substrate with an impurity concentration of less than 1x1014 cm-3, a metal layer formed on one surface of the substrate to form a surface barrier therebetween and an electrode layer mounted on the opposite surface of t...

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Bibliographic Details
Main Authors KOBAYASHI, TETSUJI, SUGITA, TOHRU, MATSUO, NOBORU
Format Patent
LanguageEnglish
Published 01.07.1980
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Summary:A radiation detector includes a detection element having a single crystal silicon substrate with an impurity concentration of less than 1x1014 cm-3, a metal layer formed on one surface of the substrate to form a surface barrier therebetween and an electrode layer mounted on the opposite surface of the substrate. Between the metal layer and electrode layer there is not applied a bias.
Bibliography:Application Number: US19780877942