Semiconductor radiation detector
A radiation detector includes a detection element having a single crystal silicon substrate with an impurity concentration of less than 1x1014 cm-3, a metal layer formed on one surface of the substrate to form a surface barrier therebetween and an electrode layer mounted on the opposite surface of t...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
01.07.1980
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Subjects | |
Online Access | Get full text |
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Summary: | A radiation detector includes a detection element having a single crystal silicon substrate with an impurity concentration of less than 1x1014 cm-3, a metal layer formed on one surface of the substrate to form a surface barrier therebetween and an electrode layer mounted on the opposite surface of the substrate. Between the metal layer and electrode layer there is not applied a bias. |
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Bibliography: | Application Number: US19780877942 |