Positive polymeric electron beam resists of very great sensitivity

It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 x 10<->6 co...

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Bibliographic Details
Main Authors HEWETT; WILLIAM A, CORTELLINO; CHARLES A, GIPSTEIN; EDWARD, MOREAU; WAYNE M, JOHNSON; DUANE E
Format Patent
LanguageEnglish
Published 07.12.1976
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 x 10<->6 coulombs/cm2.
Bibliography:Application Number: US19740454058