SEMICONDUCTOR DEVICE

The materials or dimensions of a gate insulating film or a gate electrode of an insulated gate field effect type semiconductor device are made different, so as to provide a gate of two or more gate parts having different structures.

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Bibliographic Details
Main Authors KOZAWA T,JA, MASUDA H,JA, NAGATA M,JA, MASUHARA T,JA
Format Patent
LanguageEnglish
Published 17.12.1974
Subjects
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Summary:The materials or dimensions of a gate insulating film or a gate electrode of an insulated gate field effect type semiconductor device are made different, so as to provide a gate of two or more gate parts having different structures.
Bibliography:Application Number: US19720266043