SEMICONDUCTOR DEVICE
The materials or dimensions of a gate insulating film or a gate electrode of an insulated gate field effect type semiconductor device are made different, so as to provide a gate of two or more gate parts having different structures.
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
17.12.1974
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Subjects | |
Online Access | Get full text |
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Summary: | The materials or dimensions of a gate insulating film or a gate electrode of an insulated gate field effect type semiconductor device are made different, so as to provide a gate of two or more gate parts having different structures. |
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Bibliography: | Application Number: US19720266043 |