ANTISTATIC LIGHT-SENSITIVE PHOTOGRAPHIC MATERIAL

A multi-layered, light-sensitive silver halide photographic material wherein at least one of its outer layers comprises an ethylene oxide addition polymer of a phenol-formalin condesate, in which the molar proportion of ethylene oxide is not more than 30 moles per structural unit of the phenol-forma...

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Bibliographic Details
Main Authors INOKUMA H,JA, WADA T,JA, AOKI K,JA, YAMAGUCHI H,JA, HORIUCHI H,JA, HORIGOME K,JA
Format Patent
LanguageEnglish
Published 26.11.1974
Subjects
AUXILIARY PROCESSES IN PHOTOGRAPHY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
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Summary:A multi-layered, light-sensitive silver halide photographic material wherein at least one of its outer layers comprises an ethylene oxide addition polymer of a phenol-formalin condesate, in which the molar proportion of ethylene oxide is not more than 30 moles per structural unit of the phenol-formalin condensate.
Bibliography:Application Number: US19720271535