INTEGRATED CIRCUIT STRUCTURES HAVING AIR GAPS

Integrated circuit structures having air gaps are described. In an example, an integrated circuit structure includes alternating conductive lines and air gaps above a first dielectric layer. A dielectric structure is between adjacent ones of the conductive lines and over the air gaps. A first etch s...

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Bibliographic Details
Main Authors SUKRITTANON, Supanee, VAIDYA, Sachin, CEKLI, Seda, NASKAR, Sudipto, PEER, Akshit, KOBRINSKY, Mauro J, SALIVATI, Navneethakrishnan, BIELEFELD, Jeffery, DUTTA, Ananya, ABD EL QADER, Makram
Format Patent
LanguageEnglish
Published 03.10.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Integrated circuit structures having air gaps are described. In an example, an integrated circuit structure includes alternating conductive lines and air gaps above a first dielectric layer. A dielectric structure is between adjacent ones of the conductive lines and over the air gaps. A first etch stop layer is on the dielectric structure but not on the conductive lines. A second etch stop layer is on the first etch stop layer and on the conductive lines. A second dielectric layer is above the second etch stop layer. A conductive via structure is in the second dielectric layer, in the second etch stop layer, and on one of the conductive lines.
Bibliography:Application Number: US202318129873