CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of th...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
03.10.2024
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Subjects | |
Online Access | Get full text |
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Summary: | An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount. |
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Bibliography: | Application Number: US202418734904 |