APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED SURFACE OF A MIRROR MODULE, PROJECTION SYSTEM, ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS

Mirror module for a projection exposure apparatus that includes an optical used surface, an optical measurement surface, a measurement apparatus for determining the degradation state of the measurement surface, characterized in that: the mirror module comprises a temperature control apparatus config...

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Bibliographic Details
Main Authors STORM, Arnoldus Jan, KALLER, Julian, BECKER, Moritz
Format Patent
LanguageEnglish
Published 26.09.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Mirror module for a projection exposure apparatus that includes an optical used surface, an optical measurement surface, a measurement apparatus for determining the degradation state of the measurement surface, characterized in that: the mirror module comprises a temperature control apparatus configured such that the temperature of the optical measurement surface is lower than the temperature of the optical used surface.
Bibliography:Application Number: US202418732005