SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
A semiconductor device including a first active pattern and a second active pattern each extending along a first direction and arranged along a second direction intersecting the first direction each of the first and second active patterns including a central part, a first edge part, and a second edg...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
12.09.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device including a first active pattern and a second active pattern each extending along a first direction and arranged along a second direction intersecting the first direction each of the first and second active patterns including a central part, a first edge part, and a second edge part, a storage node pad on the first edge part of the first active pattern, and a bit-line node contact on the central part of the first active pattern, wherein a top surface of the bit-line node contact is located at a higher level than a top surface of the storage node pad may be provided. |
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Bibliography: | Application Number: US202318488229 |