SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

A semiconductor device including a first active pattern and a second active pattern each extending along a first direction and arranged along a second direction intersecting the first direction each of the first and second active patterns including a central part, a first edge part, and a second edg...

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Bibliographic Details
Main Authors YOON, Chan-Sic, LEE, Myeong-Dong, LEE, Kiseok, KO, Seung-Bo, KIM, Jongmin
Format Patent
LanguageEnglish
Published 12.09.2024
Subjects
ELECTRICITY
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Summary:A semiconductor device including a first active pattern and a second active pattern each extending along a first direction and arranged along a second direction intersecting the first direction each of the first and second active patterns including a central part, a first edge part, and a second edge part, a storage node pad on the first edge part of the first active pattern, and a bit-line node contact on the central part of the first active pattern, wherein a top surface of the bit-line node contact is located at a higher level than a top surface of the storage node pad may be provided.
Bibliography:Application Number: US202318488229