EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-ANISOTROPIC LAYER

An object is to provide an exposure method and an exposure device for obtaining a photo-alignment film where the accuracy of an alignment pattern is high, and a method of forming an optically-anisotropic layer. In a case where linearly polarized light is focused in a ring shape with an optical membe...

Full description

Saved in:
Bibliographic Details
Main Authors HARASAWA, Takehiko, SEKIZAWA, Yasuhiro, ANDO, Hirotoshi, NAGANO, Satoshi
Format Patent
LanguageEnglish
Published 29.08.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:An object is to provide an exposure method and an exposure device for obtaining a photo-alignment film where the accuracy of an alignment pattern is high, and a method of forming an optically-anisotropic layer. In a case where linearly polarized light is focused in a ring shape with an optical member and a film including a compound having a photo-aligned group is exposed, while rotating a polarization direction of the polarized light, the film and the optical member are relatively moved in a direction tilted with respect to an optical axis of the optical member.
Bibliography:Application Number: US202418643009