PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE

Provided are a photosensitive composition prepared with silica particles having a reactive functional group introduced to their surface, thereby having high photosensitivity and implementing a highly reliable curing pattern even in a low-temperature post-baking treatment process, and an organic ligh...

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Bibliographic Details
Main Authors LEE, Changmin, KIM, Jun Ki, BAE, Jun, KIM, Jin Hyun, KANG, Younghoon, MUN, Soung Yun, KO, Yun Jong
Format Patent
LanguageEnglish
Published 22.08.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Provided are a photosensitive composition prepared with silica particles having a reactive functional group introduced to their surface, thereby having high photosensitivity and implementing a highly reliable curing pattern even in a low-temperature post-baking treatment process, and an organic light emitting display device in which the photosensitive composition is applied.
Bibliography:Application Number: US202218566809