SEMICONDUCTOR MEMORY DEVICE
A semiconductor memory device according to an embodiment includes: a semiconductor layer extending in a first direction; a gate electrode layer including at least one metal element selected from a group consisting of tungsten (W), molybdenum (Mo), and cobalt (Co); a charge storage layer provided bet...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
08.08.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A semiconductor memory device according to an embodiment includes: a semiconductor layer extending in a first direction; a gate electrode layer including at least one metal element selected from a group consisting of tungsten (W), molybdenum (Mo), and cobalt (Co); a charge storage layer provided between the semiconductor layer and the gate electrode layer; and a first insulating layer provided between the charge storage layer and the gate electrode layer, the first insulating layer including a first region, the first region including aluminum (Al) and oxygen (O), the first insulating layer being in contact with the gate electrode layer. |
---|---|
Bibliography: | Application Number: US202418595731 |