PLASMA BASED SYSTEM FOR GENERATING ANTIMICROBIAL COATING ON FLEXIBLE POLYMERIC SUBSTRATES AND PROCESS THEREOF

• Main Authors: RANE, Ramkrishna, VAID, Akshay, JOSEPH, Alphonsa, JAMNAPARA, N. I
• Format: Patent
• Language: English
• Published: 25.07.2024
• Subjects: CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR; HUMAN NECESSITIES; HYGIENE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES; MEDICAL OR VETERINARY SCIENCE; METALLURGY; METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A cylindrical magnetron sputtering assembly for coating on a flexible polymeric substrates with an antimicrobial material, said assembly comprising a sputtering setup and a cylindrical magnetron assembly; said cylindrical magnetron assembly being mounted in said sputtering setup: wherein said cylindrical magnetron assembly comprises: at least one cylindrical anode with slots mounted on a top base plate; at least one central target cylindrical cathode positioned at the center of said anode; a mechanical assembly for moving plurality of said flexible polymeric substrates; said mechanical assembly comprising at least one winder, at least one unwinder, plurality of pulleys and plurality of motors; said sputtering setup comprising plurality of magnetic field coils, vacuum chamber and plurality of power supply. Also provided is process for producing antimicrobial coating on flexible polymeric substrates by the cylindrical magnetron sputtering assembly.