CHAMBERS, METHODS, AND APPARATUS FOR GENERATING ATOMIC RADICALS USING UV LIGHT

The present disclosure relates to chambers, methods, apparatus, and related components for treating substrates. In one or more implementations, atomic radicals are generated using ultraviolet light, and the atomic radicals are used to treat a substrate. In one implementation, a chamber applicable fo...

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Bibliographic Details
Main Authors THOMAS, Shawn, RASTEGAR, Abbas
Format Patent
LanguageEnglish
Published 11.07.2024
Subjects
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present disclosure relates to chambers, methods, apparatus, and related components for treating substrates. In one or more implementations, atomic radicals are generated using ultraviolet light, and the atomic radicals are used to treat a substrate. In one implementation, a chamber applicable for use in semiconductor manufacturing includes an internal volume defined at least partially by one or more sidewalls, one or more substrate supports disposed in the internal volume, one or more transfer openings, a gas line fluidly connecting to the internal volume from outside of the internal volume, and an ultraviolet (UV) unit. The UV unit includes one or more UV light sources configured to generate UV light having a wavelength that is within a range of 170 nm to 254 nm.
Bibliography:Application Number: US202318094765