SUBSTRATE PROCESSING DEVICE AND METHOD FOR OPERATING THE SAME
A substrate processing device includes a platen, a polishing pad disposed on the platen, a first rotating body, a second rotating body spaced apart from the first rotating body, a caterpillar module disposed on a portion of the polishing pad and engaged with the first rotating body and the second ro...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
11.07.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A substrate processing device includes a platen, a polishing pad disposed on the platen, a first rotating body, a second rotating body spaced apart from the first rotating body, a caterpillar module disposed on a portion of the polishing pad and engaged with the first rotating body and the second rotating body, and a temperature controller thermally connected to the caterpillar module. |
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Bibliography: | Application Number: US202318353293 |