MIDDLE OF THE LINE ARCHITECTURE WITH SUBTRACTIVE SOURCE/DRAIN CONTACT

A semiconductor device includes first and second nanosheet stacks above an upper surface of a semiconductor substrate, a first source/drain on an end of the first nanosheet stack, and a second source/drain on an end of the second nanosheet stack. A first gate stack wraps around individual channels o...

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Bibliographic Details
Main Authors Miller, Eric, Simon, Andrew Herbert, Felix, Nelson
Format Patent
LanguageEnglish
Published 04.07.2024
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