ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

An array substrate and a manufacturing method thereof are provided. The array substrate includes: a substrate; a data line and a first insulation layer which are provided on the substrate; a metal oxide semiconductor layer provided above the first insulation layer, the metal oxide semiconductor laye...

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Bibliographic Details
Main Authors CHUNG, TEN, ZHENG, HUILONG, WANG, XINGANG
Format Patent
LanguageEnglish
Published 04.07.2024
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Summary:An array substrate and a manufacturing method thereof are provided. The array substrate includes: a substrate; a data line and a first insulation layer which are provided on the substrate; a metal oxide semiconductor layer provided above the first insulation layer, the metal oxide semiconductor layer including a source and a drain which are conductors and an active layer which is a semiconductor; a gate insulation layer provided on the metal oxide semiconductor layer, and a scan line and a gate provided on the gate insulation layer, the projection of the active layer on the substrate coinciding with an overlapping area of the projection of the scan line and the projection of the data line on the substrate, the projection of the gate on the substrate coinciding with the projection of the active layer on the substrate; and a pixel electrode provided above the first insulating layer.
Bibliography:Application Number: US202118558365