RELEASE FILM FOR SEMICONDUCTOR PACKAGE, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGE USING THE SAME

Release films for a semiconductor package, manufacturing methods thereof and manufacturing methods of a semiconductor package using the same are disclosed. A release film for a semiconductor package may include an intermediate body layer including a structure in which at least one polyurethane layer...

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Bibliographic Details
Main Authors Yoon, Goan-Hee, Lee, Jeong-Eun
Format Patent
LanguageEnglish
Published 04.07.2024
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Summary:Release films for a semiconductor package, manufacturing methods thereof and manufacturing methods of a semiconductor package using the same are disclosed. A release film for a semiconductor package may include an intermediate body layer including a structure in which at least one polyurethane layer and at least one antistatic layer are laminated, a first release layer disposed on a lower surface of the intermediate body layer and having a first fine unevenness for releasability on a lower surface portion, and a second release layer disposed on an upper surface of the intermediate body layer and having a second fine unevenness for releasability on an upper surface portion. The at least one polyurethane layer may include thermosetting polyurethane having a cross-linkage.
Bibliography:Application Number: US202117922445