APPARATUSES FOR MEASURING GAP BETWEEN A SUBSTRATE SUPPORT PLANE AND GAS DISTRIBUTION DEVICE

Some embodiments provide apparatuses capable of enabling the measurement of various characteristics of a showerhead-substrate gap in a processing chamber, including at high temperatures and at low-light conditions, using an imaging system external to the processing chamber.

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Bibliographic Details
Main Authors Alden, Emily Ann, Slevin, Damien Martin, Vintila, Adriana, Bapat, Shriram Vasant
Format Patent
LanguageEnglish
Published 27.06.2024
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:Some embodiments provide apparatuses capable of enabling the measurement of various characteristics of a showerhead-substrate gap in a processing chamber, including at high temperatures and at low-light conditions, using an imaging system external to the processing chamber.
Bibliography:Application Number: US202218557250