FLUORESCENCE MICROSCOPY METROLOGY SYSTEM AND METHOD OF OPERATING FLUORESCENCE MICROSCOPY METROLOGY SYSTEM

A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the...

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Main Authors JEONG, Dokyung, KIM, Wookrae, CHOI, Changhoon, KIM, Namyoon, LEE, Myungjun, JUNG, Jaehwang, JEONG, Uidon, KIM, Doory
Format Patent
LanguageEnglish
Published 27.06.2024
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.
Bibliography:Application Number: US202318528206