IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

• Main Author: KIMURA, Keisuke
• Format: Patent
• Language: English
• Published: 27.06.2024
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

An imprint apparatus including a mold holding unit configured to hold a mold, an adjusting unit configured to adjust a pressure difference between a first pressure on a second surface on an opposite side of a first surface on which a pattern of the mold held by the mold holding unit is formed and a second pressure in a first space between a substrate and the first surface of the mold, and a control unit configured to control an imprint process, wherein the imprint process includes a separation process of separating the mold from a pattern made of a cured product of an imprint material on the substrate, and the control unit controls, in the separation process, the adjustment of the pressure difference by the adjusting unit so that the first pressure is smaller than the second pressure.