DUV LITHOGRAPHY SYSTEM

A DUV lithography apparatus comprises: a light source for generating DUV radiation at at least one operating wavelength in the DUV wavelength range; a photomask; and an optical element which transmits the DUV radiation and is spaced apart from the photomask and to which an absorbent coating is appli...

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Bibliographic Details
Main Author Six, Stephan
Format Patent
LanguageEnglish
Published 20.06.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A DUV lithography apparatus comprises: a light source for generating DUV radiation at at least one operating wavelength in the DUV wavelength range; a photomask; and an optical element which transmits the DUV radiation and is spaced apart from the photomask and to which an absorbent coating is applied. The absorbent coating has absorbent microstructures which cover a surface region to which the absorbent coating is applied with a surface area proportion of less than 0.1% and optionally more than 0.01%.
Bibliography:Application Number: US202418592049