INSPECTION METHOD, SUBSTRATE PROCESSING METHOD INCLUDING THE SAME, AND SUBSTRATE PROCESSING DEVICE USING THE SUBSTRATE PROCESSING METHOD

An inspection method includes extracting a first similarity by comparing first data of a first optical signal with reference data of a reference optical signal, generating a first normal distribution of the first similarity, extracting a second similarity by comparing second data of a second optical...

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Bibliographic Details
Main Authors SONG, Myunggeun, KIM, Younghoon, KIM, Changyul, PARK, Jaeyong, CHO, Sungil, KIM, Sarah, CHO, Taeil
Format Patent
LanguageEnglish
Published 20.06.2024
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Summary:An inspection method includes extracting a first similarity by comparing first data of a first optical signal with reference data of a reference optical signal, generating a first normal distribution of the first similarity, extracting a second similarity by comparing second data of a second optical signal with the reference data of the reference optical signal, generating a second normal distribution of the second similarity, and comparing the first normal distribution with the second normal distribution. The extracting of the first similarity includes deriving the first data of the first optical signal.
Bibliography:Application Number: US202318220985