CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION

Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.

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Bibliographic Details
Main Authors KIM, Hyeran, KWAK, Yoonhyun, IM, Kyuhyun, KIM, Hana, LEE, Changheon, KOH, Haengdeog, PARK, Hoyoon
Format Patent
LanguageEnglish
Published 20.06.2024
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same:wherein A11, L11, L12, a11, a12, R11 to R13, b13, n11, n12, and M+ in Formula 1 are defined as described in the specification.
Bibliography:Application Number: US202318312825