SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
A semiconductor device includes a plurality of semiconductor layers vertically separated from one another. The semiconductor device includes a gate structure that comprises a lower portion and an upper portion, wherein the lower portion wraps around each of the plurality of semiconductor layers. The...
Saved in:
Main Authors | , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
23.05.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A semiconductor device includes a plurality of semiconductor layers vertically separated from one another. The semiconductor device includes a gate structure that comprises a lower portion and an upper portion, wherein the lower portion wraps around each of the plurality of semiconductor layers. The semiconductor device includes a gate spacer that extends along a sidewall of the upper portion of the gate structure and has a bottom surface. A portion of the bottom surface of the gate spacer and a top surface of a topmost one of the plurality of semiconductor layers form an angle that is less than 90 degrees. |
---|---|
Bibliography: | Application Number: US202418426852 |