PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS

Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module (100) and includes a...

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Bibliographic Details
Main Authors SUN, Jiayi, HANSON, Kyle M, LIANG, Qiwei, YIEH, Ellie Y, HUANG, Lancelot, MCHUGH, Paul R, TSO, Alan L, BUCHBERGER, Jr., Douglas A, KOZHIKKALKANDI, Rahul, LUBOMIRSKY, Dmitry, ALEX, Nithin Thomas
Format Patent
LanguageEnglish
Published 16.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module (100) and includes an upper portion (102) with an electrode (400) and a base portion (104) which is configured to support a substrate (500) on a substrate support surface (159). The upper portion (102) and the base portion (104) are actuated toward and away from one another using one or more arms (112) and form a process volume (404). The process volume (404) is filled with a process fluid and the processing module (100) is rotated about an axis (A). An electric field is applied to the substrate (500) by the electrode (400) before the process fluid is drained from the process volume (404).
Bibliography:Application Number: US202118282509