SURFACE ENERGY MODIFICATION IN HYBRID BONDING
A semiconductor structure includes a semiconductor substrate and a dielectric layer disposed over the semiconductor substrate. The semiconductor structure includes a conductive feature embedded in the dielectric layer. The semiconductor structure includes a barrier layer disposed between the conduct...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
18.04.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor structure includes a semiconductor substrate and a dielectric layer disposed over the semiconductor substrate. The semiconductor structure includes a conductive feature embedded in the dielectric layer. The semiconductor structure includes a barrier layer disposed between the conductive feature and the dielectric layer. The semiconductor structure further includes a self-assembled monolayer (SAM) disposed over the barrier layer, at least a portion of the SAM directly contacting the conductive feature. |
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Bibliography: | Application Number: US202318313177 |