NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES

Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes: (i) an electron beam (e-beam) source for projecting e-beams at each of a plurality of landing energies on an inspected sample; (ii) an electron sensor for obtaining a measured set of electron intensitie...

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Bibliographic Details
Main Authors Hadar, Uri, Eilon, Michal, Girmonsky, Doron, Shemesh, Dror
Format Patent
LanguageEnglish
Published 21.03.2024
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Summary:Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes: (i) an electron beam (e-beam) source for projecting e-beams at each of a plurality of landing energies on an inspected sample; (ii) an electron sensor for obtaining a measured set of electron intensities pertaining to each of the landing energies; and (iii) processing circuitry for determining a set of structural parameters, which characterizes an internal geometry and/or a composition of the inspected sample, based on the measured set of electron intensities and taking into account reference data indicative of an intended design of the inspected sample.
Bibliography:Application Number: US202318237854