DATA ANALYSIS APPARATUS, DATA ANALYSIS METHOD, AND STORAGE MEDIUM

According to one embodiment, a data analysis apparatus includes processing circuitry. The processing circuitry acquires first factor data indicative of first manufacturing conditions of a first product, and acquires second factor data indicative of second manufacturing conditions of a second product...

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Bibliographic Details
Main Authors KAWAUCHI, Keisuke, ONO, Toshiyuki, ANDO, Jumpei, WATANABE, Wataru, ITOH, Takayuki
Format Patent
LanguageEnglish
Published 14.03.2024
Subjects
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
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Summary:According to one embodiment, a data analysis apparatus includes processing circuitry. The processing circuitry acquires first factor data indicative of first manufacturing conditions of a first product, and acquires second factor data indicative of second manufacturing conditions of a second product. The processing circuitry computes, based on the first factor data, a first index value relating to a degree by which each of the first manufacturing conditions contributes to an abnormality, and computes, based on the second factor data, a second index value relating to a degree by which each of the second manufacturing conditions contributes to an abnormality. The processing circuitry computes a similarity between the first index value and the second index value.
Bibliography:Application Number: US202318176292