PHOTORESIST FILM AND APPLICATION THEREOF

A photoresist film and application thereof are provided. The photoresist film has a thickness T with a unit of μm, and when the photoresist film is characterized by ultraviolet-visible spectroscopy, the photoresist film has an absorbance A405nm at 405 nm and an absorbance A436nm at 436 nm, wherein 0...

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Bibliographic Details
Main Authors CHUANG, Zih-I, HO, E-Ming, WU, Yun-Jung
Format Patent
LanguageEnglish
Published 29.02.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A photoresist film and application thereof are provided. The photoresist film has a thickness T with a unit of μm, and when the photoresist film is characterized by ultraviolet-visible spectroscopy, the photoresist film has an absorbance A405nm at 405 nm and an absorbance A436nm at 436 nm, wherein 0<A405nm/T≤0.006 and 0<A436nm/T≤0.005, and the thickness T is 60 μm to 600 μm.
Bibliography:Application Number: US202318366468