METHODS FOR CONSTRUCTING PACKAGE SUBSTRATES WITH HIGH DENSITY

A disclosed method can include (i) positioning a first surface of a component of a semiconductor device on a first plated through-hole, (ii) covering, with a layer of dielectric material, at least a second surface of the component that is opposite the first surface of the component, (iii) removing a...

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Bibliographic Details
Main Authors Kulkarni, Deepak Vasant, Alam, Arsalan, Wilkerson, Brett P, Boyapati, Sri Ranga Sai, Swaminathan, Raja
Format Patent
LanguageEnglish
Published 08.02.2024
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Summary:A disclosed method can include (i) positioning a first surface of a component of a semiconductor device on a first plated through-hole, (ii) covering, with a layer of dielectric material, at least a second surface of the component that is opposite the first surface of the component, (iii) removing a portion of the layer of dielectric material covering the second surface of the component to form at least one cavity, and (iv) depositing conductive material in the cavity to form a second plated through-hole on the second surface of the component. Various other apparatuses, systems, and methods are also disclosed.
Bibliography:Application Number: US202217816944