SEMICONDUCTOR DEVICES

A semiconductor device includes bit lines, gate electrodes, a gate insulation pattern, a channel structure, a metal oxide pattern and a metal pattern on a substrate. The bit lines extend in a first direction and are spaced apart from each other in a second direction. The gate electrodes are disposed...

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Bibliographic Details
Main Author Uhm, Sanghoon
Format Patent
LanguageEnglish
Published 25.01.2024
Subjects
ELECTRICITY
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Summary:A semiconductor device includes bit lines, gate electrodes, a gate insulation pattern, a channel structure, a metal oxide pattern and a metal pattern on a substrate. The bit lines extend in a first direction and are spaced apart from each other in a second direction. The gate electrodes are disposed on the bit lines, spaced apart from each other in the first direction, and extend in the second direction. The gate insulation pattern is formed on a sidewall in the first direction of the gate electrodes. The channel structure is formed on a sidewall in the first direction of the gate insulation pattern. The metal oxide pattern is formed on a sidewall in the first direction of the channel structure. The metal pattern is formed on a sidewall in the first direction of the metal oxide pattern.
Bibliography:Application Number: US202318131735