VERTICAL SEMICONDUCTOR DEVICE

A vertical semiconductor device includes lower circuit patterns disposed on a first substrate. A bonding layer is disposed on the lower circuit patterns. A wire is disposed on the bonding layer. A cell stack structure is disposed on the wire. A base pattern is disposed on the cell stack structure. A...

Full description

Saved in:
Bibliographic Details
Main Authors Kim, Jaeho, Sung, Sukkang, Yang, Woosung, Lee, Ahreum, Gu, Jimo
Format Patent
LanguageEnglish
Published 11.01.2024
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A vertical semiconductor device includes lower circuit patterns disposed on a first substrate. A bonding layer is disposed on the lower circuit patterns. A wire is disposed on the bonding layer. A cell stack structure is disposed on the wire. A base pattern is disposed on the cell stack structure. An upper insulating layer is disposed on the base pattern. A cell contact plug passes through the cell stack structure and extends to the upper insulating layer. A through-plug is disposed inside a through-hole formed through an outer side of the base pattern to extend to the upper insulating layer. Each of the cell contact plug and the through-plug includes a barrier metal pattern and a metal pattern, and the barrier metal pattern is disposed along sidewalls and bottom surfaces of the cell contact hole and the through-hole.
Bibliography:Application Number: US202318312880