VERTICAL SEMICONDUCTOR DEVICE
A vertical semiconductor device includes lower circuit patterns disposed on a first substrate. A bonding layer is disposed on the lower circuit patterns. A wire is disposed on the bonding layer. A cell stack structure is disposed on the wire. A base pattern is disposed on the cell stack structure. A...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
11.01.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A vertical semiconductor device includes lower circuit patterns disposed on a first substrate. A bonding layer is disposed on the lower circuit patterns. A wire is disposed on the bonding layer. A cell stack structure is disposed on the wire. A base pattern is disposed on the cell stack structure. An upper insulating layer is disposed on the base pattern. A cell contact plug passes through the cell stack structure and extends to the upper insulating layer. A through-plug is disposed inside a through-hole formed through an outer side of the base pattern to extend to the upper insulating layer. Each of the cell contact plug and the through-plug includes a barrier metal pattern and a metal pattern, and the barrier metal pattern is disposed along sidewalls and bottom surfaces of the cell contact hole and the through-hole. |
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Bibliography: | Application Number: US202318312880 |