A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation bea...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
28.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate. |
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Bibliography: | Application Number: US202118252776 |