METHOD OF DETERMINING MARK STRUCTURE FOR OVERLAY FINGERPRINTS
An apparatus and a method for generating a metrology mark structure that can be formed on a substrate for measuring overlay characteristics induced by one or more processes performed on the substrate by determining features for the metrology mark structure based on a pattern distribution. The method...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
21.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | An apparatus and a method for generating a metrology mark structure that can be formed on a substrate for measuring overlay characteristics induced by one or more processes performed on the substrate by determining features for the metrology mark structure based on a pattern distribution. The method involves obtaining a function to characterize an overlay fingerprint induced by a process performed on a substrate. Based on the function, a pattern distribution is derived, the pattern distribution being indicative of a number of features (e.g., indicative of density) within a portion of the substrate. Based on the pattern distribution, a physical characteristic (e.g., shape, size, etc.) of the features of the metrology mark structure is determined. |
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Bibliography: | Application Number: US202118035286 |