SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS

A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical...

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Bibliographic Details
Main Authors Zhou, Wen-Zhan, Wu, Cheng-Han, Hwang, Ho-Yung David, Wang, Shih-Che, Huang, Yu-Chen, Lee, Heng-Jen, Liu, Hsu-Yuan
Format Patent
LanguageEnglish
Published 30.11.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BOTTLES, JARS OR SIMILAR CONTAINERS
CINEMATOGRAPHY
DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISEPROVIDED FOR
ELECTROGRAPHY
HOLOGRAPHY
LIQUID HANDLING
MATERIALS THEREFOR
OPENING, CLOSING
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TRANSPORTING
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Summary:A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
Bibliography:Application Number: US202318365529