SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

A transistor with stable electrical characteristics. A semiconductor device includes a first insulator over a substrate, a second insulator over the first insulator, an oxide semiconductor in contact with at least part of a top surface of the second insulator, a third insulator in contact with at le...

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Main Authors TEZUKA, Sachiaki, ICHIJO, Mitsuhiro, TANAKA, Tetsuhiro, ENDO, Toshiya, SHIMOMURA, Akihisa, EGI, Yuji, YAMAZAKI, Shunpei
Format Patent
LanguageEnglish
Published 09.11.2023
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Summary:A transistor with stable electrical characteristics. A semiconductor device includes a first insulator over a substrate, a second insulator over the first insulator, an oxide semiconductor in contact with at least part of a top surface of the second insulator, a third insulator in contact with at least part of a top surface of the oxide semiconductor, a first conductor and a second conductor electrically connected to the oxide semiconductor, a fourth insulator over the third insulator, a third conductor which is over the fourth insulator and at least part of which is between the first conductor and the second conductor, and a fifth insulator over the third conductor. The first insulator contains a halogen element.
Bibliography:Application Number: US202318136431