METHOD FOR PRODUCING A RADIATION-EMITTING SEMICONDUCTOR CHIP, AND RADIATION-EMITTING SEMICONDUCTOR CHIP

Disclosed is a method for producing a radiation-emitting semiconductor chip including the steps:-providing a semiconductor layer sequence having an active region which is designed for generating electromagnetic radiation,-producing a first recess in the semiconductor layer sequence, which fully pene...

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Bibliographic Details
Main Authors HALBRITTER, Hubert, JENTZSCH, Bruno
Format Patent
LanguageEnglish
Published 09.11.2023
Subjects
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Disclosed is a method for producing a radiation-emitting semiconductor chip including the steps:-providing a semiconductor layer sequence having an active region which is designed for generating electromagnetic radiation,-producing a first recess in the semiconductor layer sequence, which fully penetrates the active region,-producing a first structure in the first recess, wherein-at least a lateral surface of the first structure facing the active region extends obliquely to at least a first lateral surface of the semiconductor layer sequence, and-the first structure is spaced apart in lateral directions from the active region. Also disclosed is a radiation-emitting semiconductor chip.
Bibliography:Application Number: US202118042621