METHOD FOR PRODUCING A RADIATION-EMITTING SEMICONDUCTOR CHIP, AND RADIATION-EMITTING SEMICONDUCTOR CHIP
Disclosed is a method for producing a radiation-emitting semiconductor chip including the steps:-providing a semiconductor layer sequence having an active region which is designed for generating electromagnetic radiation,-producing a first recess in the semiconductor layer sequence, which fully pene...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
09.11.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is a method for producing a radiation-emitting semiconductor chip including the steps:-providing a semiconductor layer sequence having an active region which is designed for generating electromagnetic radiation,-producing a first recess in the semiconductor layer sequence, which fully penetrates the active region,-producing a first structure in the first recess, wherein-at least a lateral surface of the first structure facing the active region extends obliquely to at least a first lateral surface of the semiconductor layer sequence, and-the first structure is spaced apart in lateral directions from the active region. Also disclosed is a radiation-emitting semiconductor chip. |
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Bibliography: | Application Number: US202118042621 |