Integrated Pump Control For Dynamic Control Of Plasma Field
A pump and pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if the suction rate by the pump should be increased or decreased to achieve a stable plas...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
02.11.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A pump and pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if the suction rate by the pump should be increased or decreased to achieve a stable plasma field. A method of using such a pump and pump controller is also provided. |
---|---|
Bibliography: | Application Number: US202318139698 |