Integrated Pump Control For Dynamic Control Of Plasma Field

A pump and pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if the suction rate by the pump should be increased or decreased to achieve a stable plas...

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Bibliographic Details
Main Authors Woolford, Brady L, Fouts, Brian
Format Patent
LanguageEnglish
Published 02.11.2023
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Summary:A pump and pump controller which uses an algorithm to quickly achieve and maintain a stable plasma field in a surgical site are provided. The algorithm calculates an electrical characteristic value to determine if the suction rate by the pump should be increased or decreased to achieve a stable plasma field. A method of using such a pump and pump controller is also provided.
Bibliography:Application Number: US202318139698