PLASMA SHOWERHEAD WITH IMPROVED UNIFORMITY

Plasma showerheads with improved gas uniformity are disclosed. One or more embodiment of the disclosure provides a plasma showerhead with angled gas nozzles. Some embodiments of the disclosure have gas nozzles angled by a vertical offset angle and/or a directional offset angle. None of the gas chann...

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Bibliographic Details
Main Authors Doering, Kenneth Brian, Shah, Kartik, Griffin, Kevin, Chen, Hanhong, Zhang, Hao, Wang, Chaowei
Format Patent
LanguageEnglish
Published 05.10.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Plasma showerheads with improved gas uniformity are disclosed. One or more embodiment of the disclosure provides a plasma showerhead with angled gas nozzles. Some embodiments of the disclosure have gas nozzles angled by a vertical offset angle and/or a directional offset angle. None of the gas channels and/or the gas nozzles intersect with the plasma regions of the showerhead.
Bibliography:Application Number: US202217712046